JPH0147774B2 - - Google Patents

Info

Publication number
JPH0147774B2
JPH0147774B2 JP3230082A JP3230082A JPH0147774B2 JP H0147774 B2 JPH0147774 B2 JP H0147774B2 JP 3230082 A JP3230082 A JP 3230082A JP 3230082 A JP3230082 A JP 3230082A JP H0147774 B2 JPH0147774 B2 JP H0147774B2
Authority
JP
Japan
Prior art keywords
photosensitive
group
compounds
present
photoresist film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP3230082A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58150948A (ja
Inventor
Masanao Oozeki
Shigehiro Tanaka
Takako Fujimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DIC Corp
Original Assignee
Dainippon Ink and Chemicals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dainippon Ink and Chemicals Co Ltd filed Critical Dainippon Ink and Chemicals Co Ltd
Priority to JP3230082A priority Critical patent/JPS58150948A/ja
Publication of JPS58150948A publication Critical patent/JPS58150948A/ja
Publication of JPH0147774B2 publication Critical patent/JPH0147774B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP3230082A 1982-03-03 1982-03-03 感光性組成物 Granted JPS58150948A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3230082A JPS58150948A (ja) 1982-03-03 1982-03-03 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3230082A JPS58150948A (ja) 1982-03-03 1982-03-03 感光性組成物

Publications (2)

Publication Number Publication Date
JPS58150948A JPS58150948A (ja) 1983-09-07
JPH0147774B2 true JPH0147774B2 (en]) 1989-10-16

Family

ID=12355094

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3230082A Granted JPS58150948A (ja) 1982-03-03 1982-03-03 感光性組成物

Country Status (1)

Country Link
JP (1) JPS58150948A (en])

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60164740A (ja) * 1984-02-06 1985-08-27 Japan Synthetic Rubber Co Ltd ポジ型感光性樹脂組成物
JPS62123444A (ja) * 1985-08-07 1987-06-04 Japan Synthetic Rubber Co Ltd ポジ型感放射線性樹脂組成物
JPH0654381B2 (ja) * 1985-12-24 1994-07-20 日本合成ゴム株式会社 集積回路作製用ポジ型レジスト
JP2787943B2 (ja) * 1987-12-29 1998-08-20 三菱化学株式会社 ポジ型フォトレジスト組成物
JP2629814B2 (ja) * 1988-05-09 1997-07-16 日本合成ゴム株式会社 ポジ型感放射線性樹脂組成物
JP2800186B2 (ja) * 1988-07-07 1998-09-21 住友化学工業株式会社 集積回路製作用ポジ型レジスト組成物の製造方法
JP2636348B2 (ja) * 1988-07-20 1997-07-30 住友化学工業株式会社 ポジ型レジスト用組成物
JP2715480B2 (ja) * 1988-10-13 1998-02-18 住友化学工業株式会社 ポジ型レジスト用組成物
JP2944296B2 (ja) 1992-04-06 1999-08-30 富士写真フイルム株式会社 感光性平版印刷版の製造方法
JP3278306B2 (ja) 1994-10-31 2002-04-30 富士写真フイルム株式会社 ポジ型フォトレジスト組成物
US5541033A (en) * 1995-02-01 1996-07-30 Ocg Microelectronic Materials, Inc. Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions
JP2790132B2 (ja) * 1996-10-18 1998-08-27 住友化学工業株式会社 集積回路製作用ポジ型レジストパターンの形成方法
US6699896B1 (en) 1998-05-12 2004-03-02 Wyeth Oxazole-aryl-carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6221902B1 (en) 1998-05-12 2001-04-24 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia
US6451827B2 (en) 1998-05-12 2002-09-17 Wyeth 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6232322B1 (en) 1998-05-12 2001-05-15 American Home Products Corporation Biphenyl oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
WO1999061410A1 (en) 1998-05-12 1999-12-02 American Home Products Corporation 2,3,5-substituted biphenyls useful in the treatment of insulin resistance and hyperglycemia
US6110963A (en) * 1998-05-12 2000-08-29 American Home Products Corporation Aryl-oxo-acetic acids useful in the treatment of insulin resistance and hyperglycemia
US6310081B1 (en) 1999-05-10 2001-10-30 American Home Products Corporation Biphenyl sulfonyl aryl carboxylic acids useful in the treatment of insulin resistance and hyperglycemia

Also Published As

Publication number Publication date
JPS58150948A (ja) 1983-09-07

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